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[IEEE 2008 IEEE Custom Integrated Circuits Conference - CICC 2008 - San Jose, CA, USA (2008.09.21-2008.09.24)] 2008 IEEE Custom Integrated Circuits Conference - Lithography options for the 32nm half pitch node and beyond
Ronse, K., Jansen, Ph., Gronheid, R., Hendrickx, E., Maenhoudt, M., Goethals, M., Vandenberghe, G.Year:
2008
Language:
english
DOI:
10.1109/cicc.2008.4672100
File:
PDF, 1.76 MB
english, 2008