TCAD development for lithography resolution enhancement

IBM Journal of Research and Development 2001 Vol. 45; Iss. 5

TCAD development for lithography resolution enhancement

Liebmann, L. W., Mansfield, S. M., Wong, A. K., Lavin, M. A., Leipold, W. C., Dunham, T. G.
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Volume:
45
Year:
2001
Language:
english
Journal:
IBM Journal of Research and Development
DOI:
10.1147/rd.455.0651
File:
PDF, 670 KB
english, 2001
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