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[IEEE 2006 European Solid-State Device Research Conference - Montreux, Switzerland (2006.09.19-2006.09.21)] 2006 European Solid-State Device Research Conference - High Performance pMOSFET with ALD-TiN/HfO2 Gate Stack on (110) Substrate by Low Temperature Process
Tai, K., Hirano, T., Yamaguchi, S., Ando, T., Hiyama, S., Wang, J., Nagahama, Y., Kato, T., Yamanaka, M., Terauchi, S., Kanda, S., Yamamoto, R., Tateshita, Y., Tagawa, Y., Iwamoto, H., Saito, M., NagaYear:
2006
Language:
english
DOI:
10.1109/essder.2006.307653
File:
PDF, 3.46 MB
english, 2006