Influence of temperature and hydrogen rate on silicon incorporation in silica films by reactive magnetron co-sputtering
S. Chausserie, N. Khalfaoui, C. Dufour, J. Vicens, P. Marie, F. GourbilleauVolume:
27
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.optmat.2004.08.057
File:
PDF, 409 KB
english, 2005