The resistance against optical damage of...

The resistance against optical damage of near-stoichiometric LiNbO3:Mg crystals prepared by vapor transport equilibration

Shaolin Chen, Hongde Liu, Yongfa Kong, Ziheng Huang, Jingjun Xu, Guangyin Zhang
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Volume:
29
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.optmat.2006.01.014
File:
PDF, 142 KB
english, 2007
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