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[IRE 1982 International Electron Devices Meeting - ()] 1982 International Electron Devices Meeting - Ultra-thin gate-oxide characteristics and MOS/VLSI scaling implications
Yu-Pin Han,, Mize, J., Mozdzen, T., O'Keefe, T., Pinto, J., Worley, R.Year:
1982
Language:
english
DOI:
10.1109/iedm.1982.190223
File:
PDF, 344 KB
english, 1982