Implantation ionique à haute énergie du Si dans l'AsGa

Implantation ionique à haute énergie du Si dans l'AsGa

Azelmad, A., Currie, J. F., Yelon, A., Sood, P.
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Volume:
65
Journal:
Canadian Journal of Physics
DOI:
10.1139/p87-155
Date:
August, 1987
File:
PDF, 174 KB
1987
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