![](/img/cover-not-exists.png)
[IEEE 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu, Taiwan (2007.04.23-2007.04.25)] 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - A Self-Aligned Contact Architecture with W-Gate for NOR Flash Technology Scaling
Blosse, A., Wei, M., Bhachawat, V., Hineman, M., Koval, R., Gorman, J., Kau, D., Tewg, J., Wang, L., Hajra, M., Schroeder, P., Woo, B.J., Fazio, A.Year:
2007
Language:
english
DOI:
10.1109/vtsa.2007.378934
File:
PDF, 689 KB
english, 2007