[IEEE 2008 International Workshop on Junction Technology (IWJT) - Shanghai, China (2008.05.15-2008.05.16)] Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08) - Embedded silicon germanium (eSiGe) technologies for 45nm nodes and beyond
Naoyoshi Tamura,, Yosuke Shimamune,, Hirotaka Maekawa,Year:
2008
Language:
english
DOI:
10.1109/iwjt.2008.4540021
File:
PDF, 373 KB
english, 2008