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[IEEE International Conference on Advanced Thermal Processing of Semiconductors - Charleston, NC, USA (23-26 Sept. 2003)] 11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 - Continuity in the development of ultra shallow junctions for 130-45 nm CMOS: the tool and annealing methods

Kuznetsov, V.I., van Zutphen, A.J.M.M., Kerp, H.R., Vermont, P.G., Pages, X., van Hapert, J.J., van der Jeugd, K., Granneman, E.H.A.
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Year:
2003
Language:
english
DOI:
10.1109/rtp.2003.1249125
File:
PDF, 706 KB
english, 2003
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