Interfacial-Layer-Driven Dielectric Degradation and Breakdown of HfSiON/SiON Gate Dielectric nMOSFETs
Choi, Do-Young, Lee, Kyong Taek, Baek, Chang-Ki, Sohn, Chang Woo, Sagong, Hyun Chul, Jung, Eui-Young, Lee, Jeong-Soo, Jeong, Yoon-HaVolume:
32
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2011.2161861
Date:
October, 2011
File:
PDF, 454 KB
english, 2011