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[IEEE 2009 IEEE International Interconnect Technology Conference - IITC - Sapporo, Japan (2009.06.1-2009.06.3)] 2009 IEEE International Interconnect Technology Conference - Challenges of Ultra low-k integration in BEOL interconnect for 45nm and beyond
Liu, H., Widodo, J., Liew, S. L., Wang, Z. H., Wang, Y. H., Lin, B. F., Wu, L. Z., Seet, C. S., Lu, W., Low, C.H., Liu, W. P., Zhou, M. S., Hsia, L. C.Year:
2009
Language:
english
DOI:
10.1109/iitc.2009.5090403
File:
PDF, 618 KB
english, 2009