[IEEE 2008 IEEE International Electron Devices Meeting...

  • Main
  • [IEEE 2008 IEEE International Electron...

[IEEE 2008 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2008.12.15-2008.12.17)] 2008 IEEE International Electron Devices Meeting - Scaling of 32nm low power SRAM with high-K metal gate

Yang, H. S., Wong, R., Hasumi, R., Gao, Y., Kim, N.S., Lee, D. H., Badrudduza, S., Nair, D., Ostermayr, M., Kang, H., Zhuang, H., Li, J., Kang, L., Chen, X., Thean, A., Arnaud, F., Zhuang, L., Schille
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2008
Language:
english
DOI:
10.1109/iedm.2008.4796660
File:
PDF, 769 KB
english, 2008
Conversion to is in progress
Conversion to is failed