Charge dissipation in e-beam lithography with Novolak-based...

Charge dissipation in e-beam lithography with Novolak-based conducting polymer films

Abargues, R, Nickel, U, Rodríguez-Cantó, P J
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
19
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/19/12/125302
Date:
March, 2008
File:
PDF, 615 KB
english, 2008
Conversion to is in progress
Conversion to is failed