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Charge dissipation in e-beam lithography with Novolak-based conducting polymer films
Abargues, R, Nickel, U, Rodríguez-Cantó, P JVolume:
19
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/19/12/125302
Date:
March, 2008
File:
PDF, 615 KB
english, 2008