[IEEE 2006 Symposium on VLSI Technology, 2006. Digest of...

  • Main
  • [IEEE 2006 Symposium on VLSI...

[IEEE 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Honolulu, HI, USA (June 13-15, 2006)] 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - A Raised Source/Drain Extension pFET on Si [110] Realized by In-situ Doped Selective Epitaxy Technology

Wang, J., Kikuchi, Y., Tateshita, Y., Kato, T., Kataoka, T., Hirano, T., Nagano, K., Ikuta, T., Miyanami, Y., Fujita, S., Hiyama, S., Yamamoto, R., Kanda, S., Yamakawa, S., Kimura, T., Kugimiya, K., Y
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2006
Language:
english
DOI:
10.1109/vlsit.2006.1705281
File:
PDF, 547 KB
english, 2006
Conversion to is in progress
Conversion to is failed