Effect of Fluorocarbon Polymer Buildup on Etching in O[sub 2]∕Ar and CF[sub 4]∕CHF[sub 3]∕Ar Plasma
Lee, Dong-DukVolume:
144
Year:
1997
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1837677
File:
PDF, 255 KB
english, 1997