[IEEE 2006 International Symposium on Semiconductor Manufacturing (ISSM) - Tokyo, Japan (2006.09.25-2006.09.27)] 2006 IEEE International Symposium on Semiconductor Manufacturing - The Static Elimination System with Soft X-ray Air Ionizer Used in ULSI Cleanroom
Sakuyama, Masafumi, Takeuchi, Manabu, Terasige, Takashi, Ujiie, Shouta, Okano, KazuoYear:
2006
Language:
english
DOI:
10.1109/issm.2006.4493126
File:
PDF, 1.11 MB
english, 2006