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Al- and Cu-doped films on Si(111) substrate by molecular beam epitaxy and evaluation of depth profiles of Al and Cu atoms
M. Ajmal Khan, M. Takeishi, Y. Matsumoto, T. Saito, T. SuemasuVolume:
11
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.phpro.2011.01.026
File:
PDF, 307 KB
english, 2011