Growth of Al-doped p-type films by molecular beam epitaxy and the effect of high-temperature annealing on their electrical properties
M. Takeishi, Y. Matsumoto, R. Sasaki, T. Saito, T. SuemasuVolume:
11
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.phpro.2011.01.030
File:
PDF, 297 KB
english, 2011