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Surface characterization of homoepitaxial - FeSi2 film on - FeSi2 (111) substrate by X-ray photoelectron and absorption spectroscopy
F. Esaka, H. Yamamoto, H. Udono, N. Matsubayashi, K. Yamaguchi, S. Shamoto, M. Magara, T. KimuraVolume:
11
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.phpro.2011.01.043
File:
PDF, 283 KB
english, 2011