[IEEE 2010 21st Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - San Francisco, CA, USA (2010.07.11-2010.07.13)] 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Methodology for trench capacitor etch optimization using voltage contrast inspection and special processing
Patterson, Oliver D., Zhou, Xing J., Takalkar, Rohit S., Hawkins, Katherine V., Beckmann, Eric H., Messenger, Brian W., Hahn, RolandYear:
2010
Language:
english
DOI:
10.1109/asmc.2010.5551433
File:
PDF, 936 KB
english, 2010