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[IEEE 2008 International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA) - Hsinchu, Taiwan (2008.04.21-2008.04.23)] 2008 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - A Study of Slow Erasing Speed at Edge Cell in Nano-Scale NAND Flash Memory
Wang, Hsin-Heng, Huang, Chiu-Tsung, Chen, Shin-Hsien, Kuo, Ricky, Liu, Sophia, Yang, Ling-Kuey, Wei, Houng-Chi, Pittikoun, Saysamone, Shirota, Riichiro, Cho, Chin-chenYear:
2008
Language:
english
DOI:
10.1109/vtsa.2008.4530811
File:
PDF, 1.30 MB
english, 2008