57Fe diffusion in n-type Si after GeV implantation of 57Mn

57Fe diffusion in n-type Si after GeV implantation of 57Mn

Y. Yoshida, Y. Kobayashi, K. Yukihira, K. Hayakawa, K. Suzuki, A. Yoshida, H. Ueno, A. Yoshimi, K. Shimada, D. Nagae, K. Asahi, G. Langouche
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Volume:
401-402
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.physb.2007.08.122
File:
PDF, 330 KB
english, 2007
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