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[IEEE 2010 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2010.12.6-2010.12.8)] 2010 International Electron Devices Meeting - RF CMOS technology scaling in High-k/metal gate era for RF SoC (system-on-chip) applications
Jan, C.-H., Agostinelli, M., Deshpande, H., El-Tanani, M. A., Hafez, W., Jalan, U., Janbay, L., Kang, M., Lakdawala, H., Lin, J., Lu, Y-L, Mudanai, S., Park, J., Rahman, A., Rizk, J., Shin, W.-K., SouYear:
2010
Language:
english
DOI:
10.1109/iedm.2010.5703431
File:
PDF, 1.10 MB
english, 2010