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[IEEE 2007 International Symposium on Semiconductor Manufacturing - Santa Clara, CA, USA (2007.10.15-2007.10.17)] 2007 International Symposium on Semiconductor Manufacturing - Damascene Cu : Dielectric nitride capping surface plasma treatment optimization for flash memory devices
Brennan, Bill, Pangrle, Suzette, Evans, Allen, Lu You,, Min-Van Ngo,, Wen Jie Qi,, Baker, Ray, Won-Chong Baek,, Romero, Jeremias, Stockwell, Winny, Tracy, BryanYear:
2007
Language:
english
DOI:
10.1109/issm.2007.4446863
File:
PDF, 2.15 MB
english, 2007