[IEEE 2006 1st IEEE International Conference on Nano/Micro Engineered and Molecular Systems - Zhuhai, China (2006.01.18-2006.01.21)] 2006 1st IEEE International Conference on Nano/Micro Engineered and Molecular Systems - Buried Mask Revelation in Silicon Dioxide for Double Gate MOS Fabrication
Charavel, R., Raskin, J.-P.Year:
2006
Language:
english
DOI:
10.1109/nems.2006.334668
File:
PDF, 5.12 MB
english, 2006