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[IEEE 2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Yokohama, Japan (2014.9.9-2014.9.11)] 2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Accurate fringe capacitance model considering RSD and metal contact for realistic FinFETs and circuit performance simulation

Choe, Kyeungkeun, An, TaeYoon, Kim, SoYoung
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Year:
2014
Language:
english
DOI:
10.1109/sispad.2014.6931555
File:
PDF, 514 KB
english, 2014
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