Impact of silicide formation on the resistance of common...

IEEE Electron Device Letters 2001 / 10 Vol. 22; Iss. 10

Impact of silicide formation on the resistance of common source/drain region

Bing-Yue Tsui,, Ming-Da Wu,, Tian-Choy Gan,
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Volume:
22
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/55.954912
Date:
October, 2001
File:
PDF, 53 KB
english, 2001
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