[IEEE 2009 IEEE 36th International Conference on Plasma Science (ICOPS) - San Diego, CA, USA (2009.06.1-2009.06.5)] 2009 IEEE International Conference on Plasma Science - Abstracts - Extreme ultraviolet (EUV) radiation and plasma diagnostics of the dense plasma focus for EUV lithography (EUVL)
Young June Hong,, Min Kyung Kang,, Do Yeon Kwon,, Hee Myoung Shin,, Eun Ha Choi,Year:
2009
Language:
english
DOI:
10.1109/plasma.2009.5227410
File:
PDF, 151 KB
english, 2009