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[IEEE 2004 Semiconductor Manufacturing Technology Workshop - Hsinchu, Taiwan (9-10 Sept. 2004)] 2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846) - Global CD uniformity improvement using dose modulation pattern correction of pattern density-dependent and position-dependent errors
Chia-Jen Chen,, Hsin-Chang Lee,, Lee-Chih Yeh,, Kai-Chung Liu,, Ta-Cheng Lien,, Yi-Chun Chuo,, Hung-Chang Hsieh,, Lin, B.J.Year:
2004
Language:
english
DOI:
10.1109/smtw.2004.1393734
File:
PDF, 241 KB
english, 2004