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Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media
Brombacher, Christoph, Saitner, Marc, Pfahler, Christian, Plettl, Alfred, Ziemann, Paul, Makarov, Denys, Assmann, Daniel, Siekman, Martin H, Abelmann, Leon, Albrecht, ManfredVolume:
20
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/20/10/105304
Date:
March, 2009
File:
PDF, 2.05 MB
english, 2009