[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference - Shimane, Japan (31 Oct.-2 Nov. 2001)] Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) - Simulation parameter effects on critical dimension and sensitivity of 193 nm Chemically Amplified Resist
Sang-Kon Kim,, Dong-Soo Sohn,, Eun-Jung Seo,, Jin-Young Kim,, Young-Soo Sohn,, Hye-Keun Oh,Year:
2001
Language:
english
DOI:
10.1109/imnc.2001.984172
File:
PDF, 191 KB
english, 2001