[IEEE 2006 International Conference on Simulation of Semiconductor Processes and Devices - Monterey, CA, USA (2006.09.6-2006.09.8)] 2006 International Conference on Simulation of Semiconductor Processes and Devices - Novel Asymmetric Raised Source/Drain Extension MOSFET
Imoto, Tsutomu, Tateshita, Yasushi, Kobayashi, ToshioYear:
2006
Language:
english
DOI:
10.1109/sispad.2006.282915
File:
PDF, 4.43 MB
english, 2006