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[American Vacuum Soc 2001 6th International Symposium on Plasma- and Process-Induced Damage - Monterey, CA, USA (13-15 May 2001)] 2001 6th International Symposium on Plasma- and Process-Induced Damage (IEEE Cat. No.01TH8538) - Effect of reactive ion etching chemistry on plasma damage in EPROM cells
Barlingay, C.K., Yach, R., Lukaszek, W.Year:
2001
Language:
english
DOI:
10.1109/ppid.2001.929983
File:
PDF, 297 KB
english, 2001