[IEEE ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005. - San Jose, CA, USA (2005.09.13-2005.09.15)] ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005. - Influence of the atmosphere on ultra-thin oxynitride films by plasma nitride process
Saki, K., Shimizu, T., Mori, S., Yamamoto, A.Year:
2005
Language:
english
DOI:
10.1109/issm.2005.1513335
File:
PDF, 229 KB
english, 2005