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[IEEE 2010 IEEE International Reliability Physics Symposium - Garden Grove (Anaheim), CA, USA (2010.05.2-2010.05.6)] 2010 IEEE International Reliability Physics Symposium - Dependence of the negative bias temperature instability on the gate oxide thickness
Pobegen, Gregor, Aichinger, Thomas, Nelhiebel, Michael, Grasser, TiborYear:
2010
Language:
english
DOI:
10.1109/irps.2010.5488670
File:
PDF, 221 KB
english, 2010