[IEEE 2006 International Symposium on VLSI Technology,...

  • Main
  • [IEEE 2006 International Symposium on...

[IEEE 2006 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu (2006.04.24-2006.04.26)] 2006 International Symposium on VLSI Technology, Systems, and Applications - A Novel Deep Trench Isolation Featuring Airgaps for a High-Speed 0.13μm SiGe:C BiCMOS Technology

Choi, L.J., Kunnen, E., Van Huylenbroeck, S., Piontck, A., Sibaja-Hemandez, A., Vleugels, F., Dupont, T., Leray, P., Devriondt, K., Shi, X.P., Loo, R., Vanhaelemeersch, S., Decoutere, S.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2006
Language:
english
DOI:
10.1109/vtsa.2006.251079
File:
PDF, 2.00 MB
english, 2006
Conversion to is in progress
Conversion to is failed