Plasma-etching processes for ULSI semiconductor circuits

IBM Journal of Research and Development 1999 / 01 Vol. 43; Iss. 1.2

Plasma-etching processes for ULSI semiconductor circuits

Armacost, M., Hoh, P. D., Wise, R., Yan, W., Brown, J.J., Keller, J. H., Kaplita, G. A., Halle, S. D., Muller, K. P., Naeem, M. D., Srinivasan, S., Ng, H. Y., Gutsche, M., Gutmann, A., Spuler, B.
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Volume:
43
Language:
english
Journal:
IBM Journal of Research and Development
DOI:
10.1147/rd.431.0039
Date:
January, 1999
File:
PDF, 3.03 MB
english, 1999
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