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[American Vacuum Soc 1998 3rd International Symposium on Plasma Process-Induced Damage - Honolulu, HI, USA (4-5 June 1998)] 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) - Responses of electron shading consistently indicating low-energy ion effect [ICP etching]
Hashimoto, K., Hasegawa, A., Shimpuku, F., Nakamura, M.Year:
1998
Language:
english
DOI:
10.1109/ppid.1998.725604
File:
PDF, 271 KB
english, 1998