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[IEEE 2006 International Conference on Simulation of Semiconductor Processes and Devices - Monterey, CA, USA (2006.09.6-2006.09.8)] 2006 International Conference on Simulation of Semiconductor Processes and Devices - Modeling of stress-dependent wet etch characteristic for P-SOG STI process
Min, Jeong-guk, Rha, Sang-ho, Kim, Tai-kyung, Kwon, Ui-hui, Goo, Ju-seon, Park, Young-kwan, Kong, Jeong-taekYear:
2006
Language:
english
DOI:
10.1109/sispad.2006.282885
File:
PDF, 2.83 MB
english, 2006