[IEEE 11th International Conference on Ion Implantation Technology - Austin, TX, USA (16-21 June 1996)] Proceedings of 11th International Conference on Ion Implantation Technology - Source/drain profile engineering with plasma implantation
Jones, E.C., Cheung, N.W., Jiqun Shao,, Denholm, A.S.Year:
1997
Language:
english
DOI:
10.1109/iit.1996.586544
File:
PDF, 461 KB
english, 1997