[IEEE 2007 International Symposium on Semiconductor Manufacturing - Santa Clara, CA, USA (2007.10.15-2007.10.17)] 2007 International Symposium on Semiconductor Manufacturing - Fast characterization of electrical fails overlaying to inline defect inspection during 90 nm copper logic technology development
Weiss, Volkmar, Fuhrmann, Erik, Junge, Axel, Lutz, Robert, Rochel, Markus, Seider-Schmidt, Martina, Unger, Ralph-Stephan, Wallace, Christine, Kuei, JohnnyYear:
2007
Language:
english
DOI:
10.1109/issm.2007.4446891
File:
PDF, 1.24 MB
english, 2007