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Titanium oxide films on Si(100) deposited by e-beam evaporation
Jang, H. K., Whangbo, S. W., Choi, Y. K., Chung, Y. D., Jeong, K., Whang, C. N., Lee, Y. S., Lee, H-S., Choi, J. Y., Kim, G. H., Kim, T. K.Volume:
18
Year:
2000
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1312377
File:
PDF, 649 KB
english, 2000