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Effects of pulse bias duty cycle on fullerenelike nanostructure and mechanical properties of hydrogenated carbon films prepared by plasma enhanced chemical vapor deposition method
Ji, Li, Li, Hongxuan, Zhao, Fei, Quan, Weilong, Chen, Jianmin, Zhou, HuidiVolume:
105
Year:
2009
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3125528
File:
PDF, 579 KB
english, 2009