Pulsed Laser Annealing of Silicon-Carbon Source/Drain in...

IEEE Electron Device Letters 2008 / 05 Vol. 29; Iss. 5

Pulsed Laser Annealing of Silicon-Carbon Source/Drain in MuGFETs for Enhanced Dopant Activation and High Substitutional Carbon Concentration

Koh, A.T.-Y., Rinus Tek-Po Lee,, Fang-Yue Liu,, Tsung-Yang Liow,, Kian Ming Tan,, Xincai Wang,, Samudra, G.S., Balasubramanian, N., Dong-Zhi Chi,, Yee-Chia Yeo,
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Volume:
29
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2008.920275
Date:
May, 2008
File:
PDF, 338 KB
english, 2008
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