Measurement and characterization of multilayered...

IEEE Transactions on Semiconductor Manufacturing 1998 / Nov. Vol. 11; Iss. 4

Measurement and characterization of multilayered interconnect capacitance for deep-submicron VLSI technology

Jae-Kyung Wee,, Young June Park,, Hong Shick Min,, Dae-Hyung Cho,, Man-Ho Seung,, Hun-Sup Park,
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Volume:
11
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/66.728561
Date:
January, 1998
File:
PDF, 280 KB
english, 1998
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