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[American Vacuum Soc 2002 7th International Symposium on Plasma- and Process-Induced Damage - Maui, HI, USA (5-7 June 2002)] 7th International Symposium on Plasma- and Process-Induced Damage - Electron shading effects during oxide etching in uniform and non-uniform plasmas
Lukaszek, W., Shields, J.Year:
2002
Language:
english
DOI:
10.1109/ppid.2002.1042611
File:
PDF, 255 KB
english, 2002