[IEEE 2010 International Semiconductor Conference (CAS 2010) - Sinaia (2010.10.11-2010.10.13)] CAS 2010 Proceedings (International Semiconductor Conference) - On the morphology and texture of InN thin films deposited by reactive RF-magnetron sputtering
Braic, M, Zoita, N C, Braic, VYear:
2010
Language:
english
DOI:
10.1109/smicnd.2010.5650626
File:
PDF, 801 KB
english, 2010