[IEEE 1st International Symposium on Plasma Process-Induced Damage - Santa Clara, CA (13-14 May 1996)] Proceedings of 1st International Symposium on Plasma Process-Induced Damage - Prediction of Plasma Charging Induced Gate Oxide Tunneling Current and Antenna Dependence by Plasma Charging Probe
Shawming Ma,, Mcvittie, J.P.Year:
1996
Language:
english
DOI:
10.1109/ppid.1996.715194
File:
PDF, 415 KB
english, 1996