Deposition of phase pure nickel sulfide thin films from...

Materials Science in Semiconductor Processing 2015 / 02 Vol. 30

Deposition of phase pure nickel sulfide thin films from bis(O-alkylxanthato)–nickel(II) complexes by the aerosol assisted chemical vapour deposition (AACVD) method

Akhtar, Masood, Revaprasadu, Neerish, Malik, Mohammad Azad, Raftery, James
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Volume:
30
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2014.10.023
Date:
February, 2015
File:
PDF, 2.06 MB
english, 2015
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